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Investigation of inversion layer mobility in N-channel mosfets with thin gate oxide /

Thesis--M. Phil., University of Hong Kong, 1984.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/52023453
Date January 1984
CreatorsChan, Tim-wah.
Publisher[Hong Kong : University of Hong Kong],
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceView the Table of Contents & Abstract.

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