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Etching of polyphenylene oxide in a downstream microwave plasma using NF₃, SF₆, O₂ and Ar gas mixtures

Graduation date: 2005

Identiferoai:union.ndltd.org:ORGSU/oai:ir.library.oregonstate.edu:1957/29838
Date28 September 2004
CreatorsVenkataraman, Arjun
ContributorsKoretsky, Milo D.
Source SetsOregon State University
Languageen_US
Detected LanguageEnglish
TypeThesis/Dissertation

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