Study of the N yield in a microwave plasma for the deposition of CNH materials measurement in the remote plasma, kinetic study and etching of a-C:H films by N atoms /

Description

Bochum, University, Diss., 2001.

Links & Downloads

1. http://www-brs.ub.ruhr-uni-bochum.de/netahtml/HSS/Diss/DouaiDavid/diss.pdf
2. http://deposit.ddb.de/cgi-bin/dokserv?idn=963172050

Tags

Mikrowellenplasma

Additional Fields

Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/76333310
Date	January 2001
Creators	Douai, David.
Publisher	[S.l. : s.n.],
Source Sets	OCLC
Language	English
Detected Language	English