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Surface dopant interactions in ultra-shallow junctions

Techn. University, Diss., 2005--München.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/615018997
CreatorsFrühauf, Jens.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish

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