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Micro-Raman investigation of mechanical stress in Si device structures and phonons in SiGe

Brandenburgische Techn. Univ, Diss., 2000--Cottbus.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/614473859
CreatorsDombrowski, Kai F.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
TypeOnline-Publikation.

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