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Design and analysis of a phase mask for mutifocusing

The image quality will degrade if the misfocusing problem occurs in the imaging
system. This paper is aimed to design and analyze a phase mask for mutifocusing
problem.
Depth of field is the range to get a clear image. As the lens can only gather the light
in a fixed range. Image will be more blurred when it is more from this range. In 1995
Dowski and Cathey proposed the wave-front coding to increase the system's depth of
field so that the image will less susceptible to blur due to the mutifocusing problem. A
treatment with a mask before the lens can extend the depth of field.
In this paper, we extend to multi-levels phase mask. The simulation results show
that multi-level phase mask has a better performance than the two-level phase mask.

Identiferoai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0907111-144613
Date07 September 2011
CreatorsGuo, Jian-You
ContributorsS.J.Lee, B.S.Chow, T.Lee
PublisherNSYSU
Source SetsNSYSU Electronic Thesis and Dissertation Archive
LanguageCholon
Detected LanguageEnglish
Typetext
Formatapplication/pdf
Sourcehttp://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0907111-144613
Rightsuser_define, Copyright information available at source archive

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