We use different methods to deposit Ti thin film on the ITO glass substrate. Under the circumstances of using fixed concentration of electrolyte, changing anodic time, and applying voltage, we are able to use anodic method to make ordered nano TiO2 thin film,of which the smallest pore size is 18nm and the thickness is 4500
| Identifer | oai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0726107-161715 |
| Date | 26 July 2007 |
| Creators | Lin, Yuan-hong |
| Contributors | Mei-Ying Chang, Yu-kai Han, Ping-Tsung Huang, Ben-Ruey Liaw, Wen-Yao Huang |
| Publisher | NSYSU |
| Source Sets | NSYSU Electronic Thesis and Dissertation Archive |
| Language | Cholon |
| Detected Language | English |
| Type | text |
| Format | application/pdf |
| Source | http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0726107-161715 |
| Rights | not_available, Copyright information available at source archive |
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