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Nanostructuration of epoxy networks by using polyhedral oligomeric silsesquioxanes POSS and its copolymers

A series of hybrid component based on reactive polyhedral oligomeric silsesquioxane(POSS) precusors and its reactive copolymers of PGMA were synthesized and utilized to nanobuild in epoxy. Reactive POSS and copolymer dispersed in homogenous in matrix, overcomed POSS-POSS interaction, which resulted in macroscale phase separation. The nanocomposites obtained were analyzed by Scanning electron microscopy, Transmission electron microscopy, X-ray scattering and dynamic mechanical. An analogue of POSS (denoted as POSSMOCA) was synthesized via addition reaction, which had reactive amino group bonding into epoxy network and improved the thermostability, because of the structural silicon, nitrogen and halogen. Epoxy/polyhedral oligomeric silsesquioxanes (POSS) hybrid composites were prepared from prereaction between trifunctional silanol POSS-OH and diglycidyl ether of bisphenol A (DGEBA) via silanol and the oxirane group. Reactive POSS-PGMA was polymerized via Reversible addition-fragmentation transfer polymerization. It was easy to tail the compatibility of the epoxide block copolymer with a step-growth polymerized matrix, to form nanostructure via reaction with PGMA segements. In the case of inert POSS-PMMA copolymers modified epoxy, topology of copolymer defined the final morphology and interaction between epoxy and them, because of directional hydrogen bonding and dilution effect. Tg of different epoxide conversion, obeyed of Gordon-Taylor equation and Kwei equation, k which reflected the interaction of modifier and DGEBA/MEDA and epoxy/amine oligomers, was consistent of the rheology and dynamic results.

Identiferoai:union.ndltd.org:CCSD/oai:tel.archives-ouvertes.fr:tel-00743705
Date08 June 2012
CreatorsChen, Jiang Feng
PublisherINSA de Lyon
Source SetsCCSD theses-EN-ligne, France
LanguageEnglish
Detected LanguageEnglish
TypePhD thesis

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