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A study of the cause of residual stresses in sputtered films

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1. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.387735

Identifer	oai:union.ndltd.org:bl.uk/oai:ethos.bl.uk:387735
Date	January 1995
Creators	Hudson, Craig
Publisher	University of Cambridge
Source Sets	Ethos UK
Detected Language	English
Type	Electronic Thesis or Dissertation