Li Chak Ming = 18O氧同位素效應對La0.67Ca0.33MnO3薄膜之影響 / 李澤銘. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2005. / Includes bibliographical references. / Text in English; abstracts in English and Chinese. / Li Chak Ming = 18O yang tong wei su xiao ying dui La0.67Ca0.33MnO3 bo mo zhi ying xiang / Li Zeming. / Acknowledgement --- p.i / Abstract --- p.ii / 論文摘要 --- p.iii / Table of Contents --- p.iv / List of Figures --- p.viii / List of Tables --- p.xi / Chapter Chapter 1 --- Introduction / Chapter 1.1 --- Magnetoresistance (MR) 1 - --- p.1 / Chapter 1.1.1 --- Magnetoresistance (MR) 1 - --- p.1 / Chapter 1.1.2 --- Giant Magnetoresistance (GMR) 1 - --- p.1 / Chapter 1.1.3 --- Anisotropy Magnetoresistance (AMR) 1 - --- p.2 / Chapter 1.1.4 --- Colossal Magnetoresistance (CMR) --- p.1-4 / Chapter 1.1.5 --- Double exchange mechanism 1 - --- p.6 / Chapter 1.1.6 --- Jahn-Teller effect --- p.1-6 / Chapter 1.1.7 --- Tolerance factor 1 - --- p.7 / Chapter 1.1.8 --- The effect of doping --- p.1-10 / Chapter 1.2 --- Possible origin of oxygen isotope effect --- p.1-12 / Chapter 1.3 --- Our approach --- p.1-14 / Chapter 1.4 --- Scope of this thesis work --- p.1-14 / Chapter Chapter 2 --- Experimental methods / Chapter 2.1 --- Thin film deposition --- p.2-1 / Chapter 2.1.1 --- Facing Target Sputering (FTS) --- p.2-1 / Chapter 2.1.2 --- Vacuum system --- p.2-4 / Chapter 2.2 --- Annealing systems --- p.2-6 / Chapter 2.2.1 --- Oxygen annealing system --- p.2-6 / Chapter 2.2.2 --- Oxygen exchange system --- p.2-8 / Chapter 2.2.3 --- Vacuum annealing system --- p.2-10 / Chapter 2.3 --- Characterization --- p.2-12 / Chapter 2.3.1 --- a -step profilometer --- p.2-12 / Chapter 2.3.2 --- X-ray diffraction (XRD) --- p.2-12 / Chapter 2.3.3 --- Resistance measurement --- p.2-15 / Chapter Chapter 3 --- Epitaxial growth of LCMO single layer thin film / Chapter 3.1 --- Fabrications and characterization of La0.67Ca0.33MnO3 target --- p.3-1 / Chapter 3.2 --- Substrate materials --- p.3-6 / Chapter 3.3 --- Preparation of LCMO thin film --- p.3-8 / Chapter 3.3.1 --- Deposition conditions --- p.3-8 / Chapter 3.3.2 --- Deposition procedure --- p.3-10 / Chapter 3.3.3 --- Post-annealing effect --- p.3-13 / Chapter Chapter 4 --- Oxygen in LCMO thin film / Chapter 4.1 --- Introduction --- p.4-1 / Chapter 4.2 --- High Pressure Oxygenation --- p.4-2 / Chapter 4.3 --- Characterization --- p.4-7 / Chapter 4.3.1 --- Determination of oxygen content --- p.4-9 / Chapter 4.3.2 --- "Tolerance factor, t" --- p.4-12 / Chapter Chapter 5 --- Oxygen isotope effect in LCMO thin film / Chapter 5.1 --- Introduction --- p.5-1 / Chapter 5.2 --- Identification on successiveness of oxygen exchange --- p.5-4 / Chapter 5.2.1 --- Sample preparation --- p.5-4 / Chapter 5.2.2 --- Oxygen annealing treatment --- p.5-4 / Chapter 5.2.3 --- Identification of 18O by SIMS --- p.5-4 / Chapter 5.3 --- Investigation of isotope effect on LCMO thin film --- p.5-7 / Chapter 5.3.1 --- Sample preparation --- p.5-7 / Chapter 5.3.2 --- Oxygen exchange --- p.5-7 / Chapter 5.3.3 --- Vacuum annealing --- p.5-9 / Chapter 5.3.4 --- Isotope effect --- p.5-9 / Chapter 5.4 --- Conclusions --- p.5-19 / Chapter Chapter 6 --- Isotope effect on the hopping activation energy / Chapter 6.1 --- Introduction --- p.6-1 / Chapter 6.1.1 --- Variable range hopping --- p.6-2 / Chapter 6.1.2 --- Small polaron models --- p.6-2 / Chapter 6.2 --- Activation energy --- p.6-4 / Chapter 6.3 --- Discussions --- p.6-9 / Chapter Chapter 7 --- Conclusions --- p.7-1
| Identifer | oai:union.ndltd.org:cuhk.edu.hk/oai:cuhk-dr:cuhk_325426 |
| Date | January 2005 |
| Contributors | Li, Chak Ming., Chinese University of Hong Kong Graduate School. Division of Physics. |
| Source Sets | The Chinese University of Hong Kong |
| Language | English, Chinese |
| Detected Language | English |
| Type | Text |
| Format | print, 1 v. (various paging) : ill. ; 30 cm. |
| Rights | Use of this resource is governed by the terms and conditions of the Creative Commons “Attribution-NonCommercial-NoDerivatives 4.0 International” License (http://creativecommons.org/licenses/by-nc-nd/4.0/) |
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