Photolithography is a key element of the modem integrated circuit process. It is photolithography, combined with metal deposition, that allows a three dimensional circuit to be built up on a two dimensional surface. Since it is such an important part of the semiconductor manufacturing industry, a massive base of research in this area already exists. The problem with this pre-existing research is that it is geared solely toward industrial purposes, as opposed to more academic research areas. The goal of my research is to move this industrial process into the academic setting of Pomom College.
Identifer | oai:union.ndltd.org:CLAREMONT/oai:scholarship.claremont.edu:pomona_theses-1016 |
Date | 07 May 2003 |
Creators | Musgraves, J. David |
Publisher | Scholarship @ Claremont |
Source Sets | Claremont Colleges |
Detected Language | English |
Type | text |
Format | application/pdf |
Source | Pomona Senior Theses |
Rights | © 2003 J. David Musgraves |
Page generated in 0.0014 seconds