An apparatus for the vapor phase epitaxial deposition of germanium

Description

Thesis (M.S.)--University of Wisconsin--Madison, 1966. / eContent provider-neutral record in process. Description based on print version record. Bibliography: l. 36-38.

Links & Downloads

1. http://catalog.hathitrust.org/api/volumes/oclc/53789044.html

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Additional Fields

Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/609184917
Date	January 1965
Creators	Hanson, Charles Geoffrey,
Source Sets	OCLC
Language	English
Detected Language	English