We have studied the introduction of defects in silicon wafers with low dose channelling ion implantation. (For complete abstract open document)
| Identifer | oai:union.ndltd.org:ADTP/245546 |
| Creators | Lay, Matthew Da-Hao |
| Source Sets | Australiasian Digital Theses Program |
| Language | English |
| Detected Language | English |
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