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Plazmochemická depozice vrstev z plynné fáze / Plasma-enhanced chemicial vapor deposition

Theoretical part of diploma thesis was focused on the search of the state of knowledge in the area of plasma, plasma polymerization and characterization of thin films. Plasma-enhanced chemical vapor deposition (PECVD) was described in the experimental part together with selected analytical techniques. The technology with high level of reproducibility was reached by precise control of deposition conditions, monitoring of plasma, and analysis of plasma products using mass spectrometry. The obtained results demonstrated that the elemental composition, chemical structure, optical and mechanical properties of films were influenced by effective power used.

Identiferoai:union.ndltd.org:nusl.cz/oai:invenio.nusl.cz:216779
Date January 2011
CreatorsŽák, Luboš
ContributorsSalyk, Ota, Čech, Vladimír
PublisherVysoké učení technické v Brně. Fakulta chemická
Source SetsCzech ETDs
LanguageCzech
Detected LanguageEnglish
Typeinfo:eu-repo/semantics/masterThesis
Rightsinfo:eu-repo/semantics/restrictedAccess

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