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Chemical-mechanical wear mechanism in polyurethane polishing pad materials

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Identiferoai:union.ndltd.org:ucf.edu/oai:stars.library.ucf.edu:rtd-2911
Date01 October 2000
CreatorsLi, Irene
PublisherSTARS
Source SetsUniversity of Central Florida
LanguageEnglish
Detected LanguageEnglish
Typetext
SourceRetrospective Theses and Dissertations

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