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Samovolně seskupené vrstvy na bázi křemíku / Self-assembled layers based on silicon

Thin film deposition, characterization and properties of self-assembled monolayers based on silicon were studied with emphasis on the SA monolayers deposited from vinyltriethoxysilane and vinyltrichlorsilane. The thesis is aimed at basic properties of the SA monolayer and explanation of its growth. Methods and techniques used for analysis of the monolayer were described as well. Contact angle measurements and an evaluation of the surface free energy are depicted in details. The deposited SA layers were observed with respect to their chemical composition and surface morphology by X-ray photoelectron spectroscopy (XPS), ellipsometry and atomic force microscopy (AFM).

Identiferoai:union.ndltd.org:nusl.cz/oai:invenio.nusl.cz:216517
Date January 2009
CreatorsBábík, Adam
ContributorsVeselý, Michal, Čech, Vladimír
PublisherVysoké učení technické v Brně. Fakulta chemická
Source SetsCzech ETDs
LanguageCzech
Detected LanguageEnglish
Typeinfo:eu-repo/semantics/masterThesis
Rightsinfo:eu-repo/semantics/restrictedAccess

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