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A study of the role of low energy ions in causing damage to III-V semiconductors in practical ion etching systems

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Links & Downloads
  1. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.321888
Tags
621.31042
Additional Fields
Identiferoai:union.ndltd.org:bl.uk/oai:ethos.bl.uk:321888
Date January 2000
CreatorsDeng, Ligang
PublisherUniversity of Glasgow
Source SetsEthos UK
Detected LanguageEnglish
TypeElectronic Thesis or Dissertation

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