Thermal annealing of Mo/Si multilayers to assess the stability relevant to soft x-ray projection lithography

Description

Graduation date: 1993

Links & Downloads

1. http://hdl.handle.net/1957/36091

Tags

X-ray lithography

Thin films, Multilayered

Optical coatings

Reflectance

X-ray optics

Additional Fields

Identifer	oai:union.ndltd.org:ORGSU/oai:ir.library.oregonstate.edu:1957/36091
Date	23 July 1992
Creators	Viliardos, Michael A.
Contributors	Kassner, Michael E.
Source Sets	Oregon State University
Language	en_US
Detected Language	English
Type	Thesis/Dissertation