Plasma polymer films of tetravinylsilane and mixture of tetravinylsilane and oxygen gas were deposited on silicon wafers. Oxygen gas was mixed in tetravinylsilane to improve the compatibility of thin films on glass substrates. Mass spectroscopy was employed during the cleaning of the deposition chamber to check residual gases and process gases, during plasma deposition to monitor neutral plasma species and to follow plasma stability.
| Identifer | oai:union.ndltd.org:nusl.cz/oai:invenio.nusl.cz:216225 |
| Date | January 2008 |
| Creators | Bureš, Michal |
| Contributors | Čáslavský, Josef, Čech, Vladimír |
| Publisher | Vysoké učení technické v Brně. Fakulta chemická |
| Source Sets | Czech ETDs |
| Language | Czech |
| Detected Language | English |
| Type | info:eu-repo/semantics/masterThesis |
| Rights | info:eu-repo/semantics/restrictedAccess |
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