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An AFM Study of Photoaddressable Topography in Ruthenium Sulfoxide-Doped Polysiloxane Copolymers

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Identiferoai:union.ndltd.org:OhioLink/oai:etd.ohiolink.edu:ouashonors1399042949
Date09 July 2014
CreatorsLoftus, Lauren M.
PublisherOhio University Art and Sciences Honors Theses / OhioLINK
Source SetsOhiolink ETDs
LanguageEnglish
Detected LanguageEnglish
Typetext
Sourcehttp://rave.ohiolink.edu/etdc/view?acc_num=ouashonors1399042949
Rightsunrestricted, This thesis or dissertation is protected by copyright: all rights reserved. It may not be copied or redistributed beyond the terms of applicable copyright laws.

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