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Parallel computational methods for simulating the diffusion of dopants in silicon

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1. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.385902

Identifer	oai:union.ndltd.org:bl.uk/oai:ethos.bl.uk:385902
Date	January 1991
Creators	Biswas, Ranjan
Publisher	University of Cambridge
Source Sets	Ethos UK
Detected Language	English
Type	Electronic Thesis or Dissertation