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Plasma-assisted nitrogen incorporation in thin gate dielectrics /

Thesis (Ph. D.)--Lehigh University, 1997. / Includes vita. Includes bibliographical references.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/39088002
CreatorsKaluri, Sita R.,
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
TypeAcademic dissertations

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