The present thesis deals with optimization of the formation of thin layers of metallic materials. In the theoretical part was elaborated overview of the implementation of the formation of thin- film structures, particularly using vacuum techniques. Chemical and physical vapor deposition. They were described methods of pretreatment of thin layers. The findings were discussed methods of controlling the pre-treated surface, quality control and mutual adhesion of coating layers. In the experimental part of the pre-treatment methods were selected and applied to selected substrates. Pretreatments were evaluated using a control surface by wetting angles and by atomic force microscopy. Then, the metal structure formed of copper on the pretreated substrates. Implementation by means of magnetron sputtering. Adhesion layers was checked by testing the surface lattice method. The quality was observed by scanning electron microscopy. The results were used to design the technological process of making metal layers.
Identifer | oai:union.ndltd.org:nusl.cz/oai:invenio.nusl.cz:220995 |
Date | January 2014 |
Creators | Čejka, Marek |
Contributors | Kadlec, Michal, Šubarda, Jiří |
Publisher | Vysoké učení technické v Brně. Fakulta elektrotechniky a komunikačních technologií |
Source Sets | Czech ETDs |
Language | Czech |
Detected Language | English |
Type | info:eu-repo/semantics/masterThesis |
Rights | info:eu-repo/semantics/restrictedAccess |
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