Approved for public release; distribution is unlimited / The minority carrier diffusion length is a critical parameter in the development of next generation Heterostructure Bipolar Transistors (HBT) and highly efficient solar cells. A novel technique has been developed utilizing direct imaging of electron/hole recombination via an optical microscope and a high sensitivity charge coupled device coupled to a scanning electron microscope to capture spatial information about the transport behavior (diffusion lengths/drift lengths) in luminescent solid state materials. In this work, a numerical model was developed to do a multi-parameter least squares analysis of transport images. Results were applied to the study of transport in materials at the forefront of device technology that are affected by quantum scattering effects, where few reliable experimental measurements exist. The technique allows for easy localization of the measurement site, broad application to a range of materials and potential industrial automation to aid electronics for terahertz devices. / Outstanding Thesis
| Identifer | oai:union.ndltd.org:nps.edu/oai:calhoun.nps.edu:10945/1851 |
| Date | 12 1900 |
| Creators | Bradley, Frank Mitchell |
| Contributors | Haegel, Nancy M., Luscombe, James, Naval Postgraduate School (U.S.), Department of Physics |
| Publisher | Monterey, California. Naval Postgraduate School |
| Source Sets | Naval Postgraduate School |
| Detected Language | English |
| Type | Thesis |
| Format | xiv, 97 p. : col. ill. ;, application/pdf |
| Rights | This publication is a work of the U.S. Government as defined in Title 17, United States Code, Section 101. As such, it is in the public domain, and under the provisions of Title 17, United States Code, Section 105, is not copyrighted in the U.S. |
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