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Příprava a optické vlastnosti tenkých vrstev a vrstevnatých struktur pomocí plazmochemické depozice / Deposition and optical properties of thin films and layered structures by PECVD

Thesis in theoretical part is focused on the principle of spectroscopic ellipsometry and formation of thin films by plasma-enhanced chemical vapor deposition (PECVD). In the experimental part we describe the deposition system, ellipsometer and mathematical evaluation of ellipsometric data, materials used for film formation and processing of the samples. Single-layer and multilayer structures of polymeric materials were prepared. We revealed that the optical properties of thin films are independent of film thickness. We also described the effect of the effective power and deposition gas mixture on optical properties of thin films.

Identiferoai:union.ndltd.org:nusl.cz/oai:invenio.nusl.cz:220966
Date January 2014
CreatorsKucharčík, Jan
ContributorsBoušek, Jaroslav, Čech, Vladimír
PublisherVysoké učení technické v Brně. Fakulta elektrotechniky a komunikačních technologií
Source SetsCzech ETDs
LanguageCzech
Detected LanguageEnglish
Typeinfo:eu-repo/semantics/masterThesis
Rightsinfo:eu-repo/semantics/restrictedAccess

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