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Investigation of sputtered hafnium oxides for gate dielectric applications in integrated circuits /

Thesis (M.S.)--Rochester Institute of Technology, 2006. / Typescript. Includes bibliographical references (leaves 145-146).

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/70895352
Date January 2006
CreatorsJaeger, Daniel J.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceOnline version of thesis

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