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Selektivní růst kovových materiálů na čistých a oxidovaných substrátech. / Selective growth of metallic materials on clean and oxidized substrates.

The diploma thesis deals with morphology of cobalt thin film on clean Si(111) and on silicon dioxide thin film on Si(111) studied by AFM and XPS. It is also study of selective growth of cobalt on lattice made by focused ion beam and electron lithography. In the last part, the growth of metals (Fe, Co) on surface oxide on Ni3Al(111) was studied.

Identiferoai:union.ndltd.org:nusl.cz/oai:invenio.nusl.cz:228255
Date January 2008
CreatorsKoňáková, Kateřina
ContributorsCháb, Vladimír, Čechal, Jan
PublisherVysoké učení technické v Brně. Fakulta strojního inženýrství
Source SetsCzech ETDs
LanguageCzech
Detected LanguageEnglish
Typeinfo:eu-repo/semantics/masterThesis
Rightsinfo:eu-repo/semantics/restrictedAccess

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