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The Effects of Newcomer¡¦s Person-Organization fit on Organizational Commitment¡GThe Cases of High-Tech Industry

A lot of scholars has researched on the ¡§Person-Organization fit¡¨ for the general concept discussion, but most of P-O fit focus on the goal, value, culture of organization if it can attract some different kinds of persons and affect the choice of selecting job. The study wants to further research on when the P-O fit candidate enters in the company, whether the organizational commitment will interference with self-monitoring and perceived organizational support or not. For High-Tech industry plays most important role of economics grows; therefore, the study is focus on the newcomer of High-Tech industry to research if the self-monitoring and perceived organizational support affects P-O fit on organizational commitment or not and hope it may help companies enhance the competition ability. There are two main purposes of this study; one is to understand the effect of P-O fit on organizational commitment, another is to understand the interference effect with self-monitoring and perceived organizational support on P-O fit and organization commitment.
The study is using the 25 items of P-O fit questionnaire which simplified by Ke-Wei Wu(2008), choosing the newcomer of High-Tech industry to be test sample, the total number of issuing questionnaire are 160, the number of retrieve are 138(the retrieve rate is 86.25%), and the number of valid are 132. The study uses the correlation and regression analysis of SPSS to examine, finding out the result of¡G
1.Self-monitoring has negative interference effect with P-O fit on retention commitment; it means the level of self-monitoring will interference the level of P-O fit on retention commitment.
2.Perceived organizational support has no positive interference effect with P-O fit on organizational commitment; it means the level of P-O fit on organizational commitment will not interference with the perceived organizational support.

Identiferoai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0904109-015641
Date04 September 2009
CreatorsLiu, Chu-wei
ContributorsShyh-jer Chen, Shyh-jer Chen, Shu-ling Wu, Jin-feng Uen
PublisherNSYSU
Source SetsNSYSU Electronic Thesis and Dissertation Archive
LanguageCholon
Detected LanguageEnglish
Typetext
Formatapplication/pdf
Sourcehttp://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0904109-015641
Rightsoff_campus_withheld, Copyright information available at source archive

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