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Ultra-thin Thin-film Filters and Their Applications on WDM Systems

The subject of this dissertation is to use precision cutting and polishing techniques to fabricate thin-film filters(TFFs) with a thickness of less than 100 £gm, and to discuss their applications in Wavelength Division Multiplexing(WDM) systems. To demonstrate the feasibility of the proposed technology, Si benches with wet-etching V grooves for precision fiber positioning and saw-cutting U grooves for placing the TFFs were fabricated. The insertion loss of the bench at 1.55 £gm input lights is less than - 0.5 dB.
In addition, the stress induced pass band variations of band-pass TFF for Coarse WDM(CWDM) applications were studied. The pass band width of the band-pass TFF is 20 nm. After reducing the thickness of the 1.5 mm ¡Ñ 1.5 mm BP TFF to a thickness of 50 £gm, the center wavelength shift and pass band reduction are 4.64 nm and 1.54 nm, respectively.

Identiferoai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0614105-153613
Date14 June 2005
CreatorsChou, Tzu-Hung
ContributorsAnn-Kuo Chu, Ju-Tah Tung, Yi-Jen Chiu, Hung-Wen Chang
PublisherNSYSU
Source SetsNSYSU Electronic Thesis and Dissertation Archive
LanguageCholon
Detected LanguageEnglish
Typetext
Formatapplication/pdf
Sourcehttp://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0614105-153613
Rightswithheld, Copyright information available at source archive

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