The ability to do thin film processing has been established at UCF. This paper describes the facilities available. RF and DC sputtering was used for material deposition. The parameters for both were established experimentally, and the results are presented. Resistor and capacitor test patterns were used to test the accuracy of the system. The devices were fabricated and tested; experimental results are discussed.
| Identifer | oai:union.ndltd.org:ucf.edu/oai:stars.library.ucf.edu:rtd-5675 |
| Date | 01 January 1984 |
| Creators | Delpak, Ramzi |
| Publisher | STARS |
| Source Sets | University of Central Florida |
| Language | English |
| Detected Language | English |
| Type | text |
| Format | application/pdf |
| Source | Retrospective Theses and Dissertations |
| Rights | Public Domain |
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