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Atomic Structure of Domain and Interphase Boundaries in Ferroelectric HfO₂

Though ferroelectric HfO₂ thin films are now well characterized, little is currently known about their grain substructure. In particular, the formation of domain and phase boundaries requires investigation to better understand phase stabilization, switching, and phase interconversion. Here, scanning transmission electron microscopy is applied to investigate the atomic structure of boundaries in these materials. It is found that orthorhombic/orthorhombic domain walls and coherent orthorhombic/monoclinic interphase boundaries form throughout individual grains. The results inform how interphase boundaries can impose strain conditions that may be key to phase stabilization. Moreover, the atomic structure near interphase boundary walls suggests potential for their mobility under bias, which has been speculated to occur in perovskite morphotropic phase boundary systems by mechanisms similar to domain boundary motion.

Identiferoai:union.ndltd.org:DRESDEN/oai:qucosa:de:qucosa:80508
Date26 August 2022
CreatorsGrimley, Everett D., Schenk, Tony, Mikolajick, Thomas, Schroeder, Uwe, LeBeau, James M.
PublisherWiley-VCH
Source SetsHochschulschriftenserver (HSSS) der SLUB Dresden
LanguageEnglish
Detected LanguageEnglish
Typeinfo:eu-repo/semantics/acceptedVersion, doc-type:article, info:eu-repo/semantics/article, doc-type:Text
Rightsinfo:eu-repo/semantics/openAccess
Relation2199-160X, https://doi.org/10.1002/admi.201701258, info:eu-repo/grantAgreement/Deutsche Forschungsgemeinschaft/Inferox/433647091//Ferroelektrisches Zirkonoxid für piezo- und pyroelektrische Bauelemente /Zeppelin

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