In this study, the characteristics of LPD-NiO, and lithium-doped LPD-NiO filmson glass substrate were investigated. In our experiment, we do some measurement about physical, chemical, electrical and optical properties for LPD-NiO and lithium-doped LPD-NiO films and discussed with them. The NiO film thickness was characterized by field emission scanning electron microscopy (FE-SEM), structure was characterized by X-ray diffraction (XRD), chemical properties were characterized by X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared spectroscopy (FT-IR). Electrical properties were characterized by four-point probe, and optical properties were characterized by a reflecting spectrograph. The thermal annealing was used to improve the characteristics of LPD-NiO and lithium-doped LPD-NiO films in nitrogen, air and nitrous oxide ambient. For lithium doping, the lithium chloride was used as the doping solution and the electrical characteristics were enhanced. After thermal annealing in air at 400 oC, the resistivity of NiO films is 7.5 ¡Ñ 10-1 ohm-cm and can be lowed to 7.2 ¡Ñ 10-3 ohm-cm with lithium doping.
| Identifer | oai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0725112-154115 |
| Date | 25 July 2012 |
| Creators | Lai, Yen-Ting |
| Contributors | Su-Hua Yang, Min-Yen Yeh, Ming-Kwei Lee, Kuo-Mei Chen |
| Publisher | NSYSU |
| Source Sets | NSYSU Electronic Thesis and Dissertation Archive |
| Language | English |
| Detected Language | English |
| Type | text |
| Format | application/pdf |
| Source | http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0725112-154115 |
| Rights | user_define, Copyright information available at source archive |
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