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Plasma characterization & thin film growth and analysis in highly ionized magnetron sputtering /

Diss. (sammanfattning) Linköping : Linköpings universitet, 2005. / Härtill 7 uppsatser.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/185714849
Date January 2005
CreatorsAlami, Jones,
PublisherLinköping : Dept. of Physics and Measurement Technology, Univ.,
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceSammanfattning och fulltext från Linköping University Electronic Press

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