Atomic layer deposition of copper, copper(I) oxide and copper(I) nitride on oxide substrates /

Description

Diss. (sammanfattning) Uppsala : Univ., 2004. / Härtill 6 uppsatser.

Links & Downloads

1. http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-4651
2. urn:nbn:se:uu:diva-4651

Tags

Tunnfilmsteknik.

Additional Fields

Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/186570139
Date	January 2004
Creators	Törndahl, Tobias,
Publisher	Uppsala : Acta Universitatis Upsaliensis : Univ.-bibl. [distributör],
Source Sets	OCLC
Language	English
Detected Language	English