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Residual stress in gallium nitride films grown on silicon substrates by metalorganic chemical vapor deposition

Thesis (M.S.)--Ohio University, June, 2000. / Title from PDF t.p.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/226315661
Date January 2000
CreatorsFu, Yankun.
PublisherOhio : Ohio University,
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceConnect to resource online

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