This work uses a modification of the chemical vapor deposition (CVD) technique to study the effects of source gas flow geometry (and the corresponding parameters) on carbon nanotube growth. Our approach is to flow the carbon-containing source gas through a nozzle, projecting the gas stream onto targeted regions of the substrate. This technique not only allows the potential for localized nanotube growth, but also offers an interesting opportunity to provide an experimental test of theoretical nanotube growth models.
| Identifer | oai:union.ndltd.org:CLAREMONT/oai:ccdl.libraries.claremont.edu:stc/4 |
| Date | 04 1900 |
| Creators | McFarland, James |
| Publisher | Pomona College |
| Source Sets | Claremont Colleges |
| Language | English |
| Detected Language | English |
| Type | Text |
| Format | application/pdf |
| Source | Born digital |
| Rights | Pomona College has non-exclusive publication rights. Permission is granted to quote from the thesis with the customary acknowledgment of the source. Copyright for each article is retained by the author. Republication in any form requires permission from the author of the thesis. |
| Relation | Senior Theses from The Claremont Colleges - http://ccdl.libraries.claremont.edu/seniortheses/ |
Page generated in 0.0024 seconds