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Temperature control and characterization of silicon-germanium growth by rapid thermal chemical vapor deposition /

Thesis (Ph. D.)--University of Texas at Austin, 2002. / Vita. Includes bibliographical references (leaves 163-173). Available also in a digital version from Dissertation Abstracts.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/53825033
Date January 2002
CreatorsHwang, Sung-bo,
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceFull text (PDF) from UMI/Dissertation Abstracts International

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