Fang, Qianying = 基於掃描探針顯微鏡(SPM)的關於鋁摻雜氧化鋅(ZnO:Al)局域電學性質之研究 / 方倩莹. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2008. / Includes bibliographical references (leaves 97-100). / Text in English; abstracts in English and Chinese. / Fang, Qianying = Ji yu sao miao tan zhen xian wei jing (SPM) de guan yu lü shan za yang hua xin (ZnO:Al) ju yu dian xue xing zhi zhi yan jiu / Fang Qianying. / Chapter I. --- Abstract / Chapter II. --- Acknowledgement / Chapter III. --- Table of contents / Chapter IV. --- List of figures / Chapter V. --- List of tables / Chapter 1 --- Introduction / Chapter 1.1 --- Motivations / Chapter 1.2 --- Outline of thesis / Chapter 2 --- Experimental Conditions and Techniques Used / Chapter 2.1 --- Sample preparation / Chapter 2.1.1 --- Radio frequency magnetic sputtering / Chapter 2.1.2 --- Substrates / Chapter 2.1.3 --- Thermal evaporation / Chapter 2.1.4 --- Thermal annealing / Chapter 2.2 --- Microscopic electrical measurement / Chapter 2.2.1 --- Conductive atomic force microscope (c-AFM) / Chapter 2.2.2 --- Scanning capacitance microscope (SCM) / Chapter 2.2.3 --- Surface Potential (SP) / Chapter 2.3 --- SEM and cathodoluminescence spectroscopy / Chapter 3 --- Calibrations / Chapter 3.1 --- Calibrations of c-AFM measurements / Chapter 3.1.1 --- Reproducible images / Chapter 3.1.2 --- Further statistical analysis / Chapter 3.1.3 --- Sample thickness effect / Chapter 3.1.4 --- Conclusions / Chapter 3.2 --- Calibrations of cathodeluminescence (CL) measurements / Chapter 3.2.1 --- Effect of removing residual magnetic field / Chapter 3.2.2 --- Effect of Faraday cup moving / Chapter 3.2.3 --- Time effect / Chapter 3.2.4 --- Effect of mirror shift / Chapter 3.2.5 --- Effect of electron beam shift / Chapter 3.2.6 --- Conclusions / Chapter 3.3 --- Calibrations of scanning capacitance microscope (SCM) measurements / Chapter 3.3.1 --- SCM images and morphological dependence of as-deposited AlOx/ZnO thin film / Chapter 3.3.2 --- Comparison between as-deposited and e-beam irradiated AlOx/ZnO thin film / Chapter 3.3.3 --- SCM images and morphological dependence of e-beam irradiated AlOx/ZnO thin film / Chapter 3.3.4 --- Conclusions / Chapter 4 --- Experimental Results and Data Analysis / Chapter 4.1 --- Conductive Atomic Force Microscope (c-AFM) / Chapter 4.1.1 --- Effect of scan rate / Chapter 4.1.2 --- Dual images and morphological dependence / Chapter 4.1.3 --- Statistic microscopic current-voltage (I-V) / Chapter 4.1.4 --- Schottky barrier at Pt-ZnO contact / Chapter 4.1.5 --- C-AFM artifact / Chapter 4.2 --- Scanning Capacitance Microscope (SCM) / Chapter 4.2.1 --- Dual images and morphological dependence / Chapter 4.2.2 --- Statistic microscopic SCM data-voltage (dC/dV-V) / Chapter 4.3 --- Surface Potential (SP) / Chapter 5 --- Discussions and Conclusion / Chapter 5.1 --- Mechanism / Chapter 5.2 --- Conclusions / Chapter 5.3 --- Future plan / Chapter 6 --- References
| Identifer | oai:union.ndltd.org:cuhk.edu.hk/oai:cuhk-dr:cuhk_326265 |
| Date | January 2008 |
| Contributors | Fang, Qianying., Chinese University of Hong Kong Graduate School. Division of Physics. |
| Source Sets | The Chinese University of Hong Kong |
| Language | English, Chinese |
| Detected Language | English |
| Type | Text, bibliography |
| Format | print, x, 100 leaves : ill. ; 30 cm. |
| Rights | Use of this resource is governed by the terms and conditions of the Creative Commons “Attribution-NonCommercial-NoDerivatives 4.0 International” License (http://creativecommons.org/licenses/by-nc-nd/4.0/) |
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