Modelling of phosphorus donor-based silicon (Si:P) qubit devices and mesoscopic single-electron devices is presented in this thesis. This theoretical analysis is motivated by the use of Si:P devices for scalable quantum computing. Modelling of Si:P single-electron devices (SEDs) using readily available simulation tools is presented. The mesoscopic properties of single and double island devices with source-drain leads is investigated through ion implantation simulation (using Crystal-TRIM), 3D capacitance extraction (FastCap) and single-electron circuit simulation (SIMON). Results from modelling two generations of single and double island Si:P devices are given, which are shown to accurately capture their charging behaviour. The trends extracted are used to forecast limits to the reduction in size of this Si:P architecture. Theoretical analysis of P2+:Si charge qubits is then presented. Calculations show large ranges for the SET measurement signal, Δq, and geometric ratio factor, α, are possible given the 'top-down' fabrication procedure. The charge qubit energy levels are calculated using the atomistic simulator NEMO 3-D coupled to TCAD calculations of the electrostatic potential distribution, further demonstrating the precise control required over the position of the donors. Theory has also been developed to simulate the microwave spectroscopy of P2+:Si charge qubits in a decohering environment using Floquet theory. This theory uses TCAD finite-volume modelling to incorporate realistic fields from actual device gate geometries. The theory is applied to a specific P2+:Si charge qubit device design to study the effects of fabrication variations on the measurement signal. The signal is shown to be a sensitive function of donor position. Design and analysis of two different spin qubit architectures concludes this thesis. The first uses a high-barrier Schottky contact, SET and an implanted P donor to create a double-well suitable for implementation as a qubit. The second architecture is a MOS device that combines an electron reservoir and SET into a single structure, formed from a locally depleted accumulation layer. The design parameters of both architectures are explored through capacitance modelling, TCAD simulation, tunnel barrier transmission and NEMO 3-D calculations. The results presented strengthen the viability of each architecture, and show a large Δq (> 0.1e) can be expected.
| Identifer | oai:union.ndltd.org:ADTP/257953 |
| Date | January 2008 |
| Creators | Escott, Christopher Colin, Electrical Engineering & Telecommunications, Faculty of Engineering, UNSW |
| Publisher | Publisher:University of New South Wales. Electrical Engineering & Telecommunications |
| Source Sets | Australiasian Digital Theses Program |
| Language | English |
| Detected Language | English |
| Rights | http://unsworks.unsw.edu.au/copyright, http://unsworks.unsw.edu.au/copyright |
Page generated in 0.0024 seconds