Influence of boron doping on the dynamics of formation of Os metal nanoclusters on graphitic surfaces

Description

Yes / The fabrication of osmium nanoclusters from single atoms has been studied in real-time on B-doped and B-free graphitic surfaces. The dynamics of nucleation on both surfaces are identified, captured, and reported. The nucleation is ca. 2× faster on B-doped surface compared to the B-free surface (38 pm min−1versus 18 pm min−1), suggesting osmium–boron interactions within the nanomaterials.

Links & Downloads

1. Pitto-Barry A and Barry NPE (2019) Influence of boron doping on the dynamics of formation of Os metal nanoclusters on graphitic surfaces. Chemical Communications. 55(43): 6038-6041.
2. http://hdl.handle.net/10454/17068
3. https://doi.org/10.1039/C9CC01974J

Tags

Boron doping

Os metal nanoclusters

Graphitic surfaces

Osmium

B-doped

B-free

Additional Fields

Identifer	oai:union.ndltd.org:BRADFORD/oai:bradscholars.brad.ac.uk:10454/17068
Date	07 May 2019
Creators	Pitto-Barry, Anaïs, Barry, Nicolas P.E.
Source Sets	Bradford Scholars
Language	English
Detected Language	English
Type	Article, Accepted manuscript
Rights	(c) 2019 Royal Society of Chemistry. Full-text reproduced in accordance with the publisher's self-archiving policy.