In an age in which the microchip is ubiquitous, the rewards for novel methods of microfabrification are great, and the vast possibilities of nanotechnology lie just a little ahead. Various methods of microlithography offer differing benefits, and even as older techniques such as optical lithography are being refined beyond what were once considered their upper limits of resolution, new techniques show great promise for going even further once they reach their technological maturity. Recent developments in optical lithography may allow it to break the 100-nm limit even without resorting to x-rays.
| Identifer | oai:union.ndltd.org:CLAREMONT/oai:ccdl.libraries.claremont.edu:stc/5 |
| Date | 06 May 2004 |
| Creators | Carns, Regina C. |
| Publisher | Pomona College |
| Source Sets | Claremont Colleges |
| Detected Language | English |
| Type | Text |
| Format | application/pdf |
| Source | Born digital |
| Rights | Pomona College has non-exclusive publication rights. Permission is granted to quote from the thesis with the customary acknowledgment of the source. Copyright for each article is retained by the author. Republication in any form requires permission from the author of the thesis. |
| Relation | Senior Theses from The Claremont Colleges - http://ccdl.libraries.claremont.edu/seniortheses/ |
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