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Compound semiconductor compliant substrates for extension of the conventional critical thickness in mismatched overlayers and strain-modulated epitaxy

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1. http://hdl.handle.net/1853/15512
2. 444178

Identifer	oai:union.ndltd.org:GATECH/oai:smartech.gatech.edu:1853/15512
Date	12 1900
Creators	Coman, Carrie Anne Carter
Publisher	Georgia Institute of Technology
Source Sets	Georgia Tech Electronic Thesis and Dissertation Archive
Detected Language	English
Type	Dissertation
Rights	Access restricted to authorized Georgia Tech users only.