Return to search

Iterative algorithms for corrections to proximity effects in nanolithography

No description available.
Identiferoai:union.ndltd.org:GATECH/oai:smartech.gatech.edu:1853/16711
Date05 1900
CreatorsRau, Richard
PublisherGeorgia Institute of Technology
Source SetsGeorgia Tech Electronic Thesis and Dissertation Archive
Detected LanguageEnglish
TypeThesis
RightsAccess restricted to authorized Georgia Tech users only.

Page generated in 0.0023 seconds