Indium Tin Oxide (ITO) films were deposited onto the flexible substrate as the conductive electrode of the flexible display. ITO films were deposited by RF reactive magnetron sputtering. We changed process conditions, such as RF power, process pressure and substrate temperature to get good optical and electrical properties.
ITO films with good electrical and optical properties have been obtained. The sheet resistance of the ITO films (150nm) was below 30 £[/¡¼ under low temperature and low power process condition. The (211)¡B(400)¡B(440) peaks were observed from the XRD profiles. The UV-visible spectra indicate that the average optical transmittance of ITO films is around 80% in the visible range. The surface roughness of the ITO films is also good.
| Identifer | oai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0712105-160301 |
| Date | 12 July 2005 |
| Creators | Kuo, Juin-Jie |
| Contributors | An-Kuo Chu, Mei-Ying Chang, Yu-Kai Han, Wen-Jun Zheng |
| Publisher | NSYSU |
| Source Sets | NSYSU Electronic Thesis and Dissertation Archive |
| Language | Cholon |
| Detected Language | English |
| Type | text |
| Format | application/pdf |
| Source | http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0712105-160301 |
| Rights | unrestricted, Copyright information available at source archive |
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