In this research, we used monomer 4,4¡¦¡¦¡¦¡¦-Difluore-3,3¡¦¡¦¡¦¡¦- bis(trifluoromethyl)-2¡¦¡¦,3¡¦¡¦,5¡¦¡¦,6¡¦¡¦-triphenyl and 4,4'-(9-Fluorenylidene) diphenol to fabricate the novel poly(arylene ether)s by the nucleophilic replacement reaction. We call this polymers P-44, and we use Mass and GPC to measure its molecular weight¡FThe molecular structures were investigated and confirmed by NMR and FT-IR. This polymer has high weightaverage molecular weight (Mw) about 5.67¡Ñ104 g/mol.
We can realize from the measurement of thermal analysis that its thermal degradation temperature (Td) is 543¢XC, and its glass transition temperature (Tg) is 331¢XC. It shows this polymer: P-44 possesses great thermal stability. Besides, P-44 has not apparent crystallizing point (Tc) so we can adjust that P-44 crystalize hardly. We can know from above that P-44 can not only has good heat tolerance but also has high thermal stability so it can endure futher high tempaerature in the process of fabrication. After interpreting P-44 possesses these well properties, we want to know the properties that P-44 apply to the devices as flexible substrate. So, we fabricate P-44 to be film, and we measure the photoelectrical properties of P-44 film. From this we can observer if P-44 can match the necessary condition that it apply to monitor or high frequency substrate.
In the aspect of photophysical properties, we take the 0.3mm P-44 film to measure its photophysical properties. We obtained absorption wavelength that is 245nm and 345nm, and its excitation wavelength is362nm¤Î365nm. Its main area of absorption and excitation is in the region of UV. Furthermore, the transmission spectra of P-44 film showed that visible light transparency were up to 80%. And the refractive index(n) of P-44 film is between 1.37~1.4.
In the aspect of thermal mechanical properties, we can know thermal expansion coefficient (CTE) of P-44 film is 19ppm/¢J, and we can also obtain the heat deflection temperature (HDT) of P-44 film is 316¢J. It reveals P-44 possesses low thermal expansion coefficient (CTE) and high heat deflection temperature (HDT).
In the aspect of surface, we find P-44 film has low polarity whose main component is van der waals and it has good hydrophobicity.Its contact angle with DI-water is 114.5¢X which greater than 90¢X that proves P-44 film has well hydrophobicity.
In the aspect of dielectrical properties, we found that its dielectric constant is between 2.51~2.53 under the condition of1M Hz, and its dielectric loss is between 0.0068~0.0071. It shows P-44 film possesses low dielectric constant that let the effect of parasitic capacitances lowered¡Fand low dielectric loss let the loss of signal reduced.
We can plate ITO onto P-44 film successfully, and it could be a flexible transparent conductive film.
By the all of the above results, we can realize P-44 film possesses well thermal stabilities¡Bhigh transparency in the region of visible light¡Bgood hydrophobicity¡Blow thermal expansion coefficient (CTE)¡Blow dielectric constant and low dielectric loss. With these great materialIX
properties, we can apply it to flexible photpelectric devices in the future.
| Identifer | oai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0720109-191858 |
| Date | 20 July 2009 |
| Creators | Sie, Wun-Ge |
| Contributors | Hsin-Lung Chen, Wen-Yao Huang, Mei-Ying Chang, Yu-Kai Han, Ping-Tsung Huang |
| Publisher | NSYSU |
| Source Sets | NSYSU Electronic Thesis and Dissertation Archive |
| Language | Cholon |
| Detected Language | English |
| Type | text |
| Format | application/pdf |
| Source | http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0720109-191858 |
| Rights | campus_withheld, Copyright information available at source archive |
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