In this study, the RF sputtering system has been investigated comprehensively. Firstly, the relationship among the thickness of dark space, DC bias and electrode area under RF discharge is discussed. The impedance matching network of RF sputtering system, the configuration of glow discharge and their related electrical parameters are introduced and illustrated. The network theorem is used to calculate the loading impedance of RF sputtering system and to design an impedance matching circuit. And then the equivalent circuit of sheath and plasma in parallel plate RF discharge is analyzed.
The characteristics of gas discharge of RF sputtering system are discussed, which includes the capacitance, resistance and conductivity on different pressure and magnetic field. Due to RF sputtering system usually driven at 13.56 MHz (this is an open frequency), we also considered how to avoid the radio frequency interference. In addition, the electrical characteristics of parallel plate RF discharge are revealed under argon atmosphere, and some of the general relationships between the various measured and determined parameters are also described. Finally, the difference between real system and ideal system are reported, and how to design a system which is rugged and reliable and can be operated, literally, in ¡¨push-button¡¨fashion, has been described in detail.
| Identifer | oai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0725108-003507 |
| Date | 25 July 2008 |
| Creators | Chang, Ying-Che |
| Contributors | W.C. Hsu, Yuh-Fung Huang, H. Y. Ueng, Yeu-Long Jiang |
| Publisher | NSYSU |
| Source Sets | NSYSU Electronic Thesis and Dissertation Archive |
| Language | Cholon |
| Detected Language | English |
| Type | text |
| Format | application/pdf |
| Source | http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0725108-003507 |
| Rights | not_available, Copyright information available at source archive |
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