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Development of self-built multilayer aligner for imprint process

In this paper, a new method combining imprint lithography and multiimprint was discussed to improve the generic TFT process. In order to apply the multilayer imprint, the alignment machine is essential for the whole process. Although there are many types of equipment available on the market, the cost of those alignment apparatuses is too expensive. In this paper, a simple theorem is employed to complete a low cost alignment machine with alignment accuracy to 5 £gm. Besides, in order to develop new TFT imprint photoresist, three kind of materials, AZ-series photoresist (AZ-650 a positive photoresist), HOSP (Hygrido Organic Siloxane Polymer) and SE-812, are tested for imprint and evaluate the applications of these materials in the future. The AZ-650 suits imprint process in this experiment.

Identiferoai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0803105-030316
Date03 August 2005
CreatorsCheng, Lun-hong
Contributorsnone, Cheng-Tang Pan, Yeong-Maw Hwang, Shin-Pon Ju
PublisherNSYSU
Source SetsNSYSU Electronic Thesis and Dissertation Archive
LanguageCholon
Detected LanguageEnglish
Typetext
Formatapplication/pdf
Sourcehttp://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0803105-030316
Rightsrestricted, Copyright information available at source archive

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