Transparent Conductive Oxide thin films (TCO) with low resistivity and high light transmission act as transparent electrode for many kinds of display panel. At present, Indium Tin Oxide (ITO) is common transparent electrode material. Because Indium is classified rare element, and it has toxicity. Moreover ITO is unstable in high temperature. Recent years many researches are searching adaptive materials to replace ITO. Al doped ZnO (AZO) has same characteristics of low resistivity and high light transmission, it is one of the adaptive materials.
In this study, we choice AZO and ITO target. Sputtering is a common method to deposition TCO. We sputtered the AZO film and ITO film on glass substrate and measured the characteristics respectively. In addition, because Liquid Phase Deposition (LPD) has advantages of simple process, low cost and large amount of wafers can be used. Therefore, in this study we growth ZnO thin film on glass substrate simultaneously, and doped Aluminum to increase conductivity.
| Identifer | oai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0812108-155158 |
| Date | 12 August 2008 |
| Creators | Lee, Jung-Chun |
| Contributors | Jen-Suh Chern, Ming-Kwei Lee, Tsu-Hsin Chang, Chien-Jung Huang |
| Publisher | NSYSU |
| Source Sets | NSYSU Electronic Thesis and Dissertation Archive |
| Language | English |
| Detected Language | English |
| Type | text |
| Format | application/pdf |
| Source | http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0812108-155158 |
| Rights | not_available, Copyright information available at source archive |
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