In this study, the CVD diamond films were grinded using composite electroplating in-process sharpening (CEPIS). At an applied load of 4.2 kg, a rotation speed of 200 rpm and 20 rpm for the upper and lower spindles, the effects of NiCl2 (nickel chloride) content of electrolyte (in the range of 5-75 g/l) and cathode current density (in the range of 0-7.5 ASD) on the structure of the nickel-diamond composite coating and its grinding ability were investigated. Based on the experiment results, the coating structure became porous and the coating thickness increased with decreasing NiCl2 content of electrolyte during the composite electroplating process. During CEPIS process, the material removal rate of diamond film has no obvious concern with the NiCl2 content at low cathode current density (below 2.5 ASD). However, its material removal rate rapidly increased to a saturated value with increasing NiCl2 content at high cathode current density (above 5 ASD). The NiCl2 content to achieve a saturated material removal rate increased with increasing cathode current density. In this study, the maximum removal rate of diamond film is about 0.093 mg/min at the NiCl2 content of 75 g/l and the cathode current density of 5 ASD.
| Identifer | oai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0904108-133841 |
| Date | 04 September 2008 |
| Creators | Li, Tsung-jung |
| Contributors | Jen-fin Lin, Rong-tsong Lee, Yeau-ren Jeng, Yuang-cherng Chiou |
| Publisher | NSYSU |
| Source Sets | NSYSU Electronic Thesis and Dissertation Archive |
| Language | Cholon |
| Detected Language | English |
| Type | text |
| Format | application/pdf |
| Source | http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0904108-133841 |
| Rights | campus_withheld, Copyright information available at source archive |
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