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A systematic approach to determining the limits of nanolithography at extreme NA /

Thesis (Ph.D.)--Rochester Institute of Technology, 2008. / Typescript. Includes bibliographical references (leaves 83-87).

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/276997520
Date January 2008
CreatorsBourov, Anatoly.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceOnline version of thesis

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